Plasma Device with an External RF Hollow Cathode for Plasma Cleaning of High Vacuum Systems

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20200058472A1
SERIAL NO

16601935

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Abstract

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A compact cylindrical vacuum chamber made from a dielectric ceramic or glass wrapped with a cylindrical electrode connected to an RF source make a hollow cathode RF plasma source. The dielectric cylinder is used as the vacuum container with the conductive electrode outside the vacuum region to excite plasma inside. A gas is supplied by a gas source at low flow on one end of the cylinder and after being excited exhausts into a connected vacuum chamber carrying excited metastables and radicals. RF power is applied to the electrode to excite the plasma via the hollow cathode effect. This remote RF plasma source can be used to create ions, electrons, excited metastables, and atomic radicals for use downstream depending on choices of gas, pressure, flow rates, RF power and frequency, and extraction electrodes.

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Patent Owner(s)

Patent OwnerAddress
XEI SCIENTIFIC INC1755 E BAYSHORE SUITE 17 REDWOOD CITY CA 94036

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Vane, Ronald A Redwood City, US 10 102

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