PLASMA GENERATION SYSTEM

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20200060017A1
SERIAL NO

16499467

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Abstract

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A plasma generation system capable of more accurately measuring the actual temperature of a plasma gas applied to a target object. The plasma generation system includes: an emitting head configured to generate plasma gas by supplying power to electrodes provided in a reaction chamber to generate a plasma gas by converting a processing gas into plasma, and apply the generated plasma gas to a target object; and a temperature sensor configured to detect a temperature of the plasma gas and output a detection signal corresponding to the detected temperature. The temperature sensor is arranged at a position separated from an emission port of the emitting head from which the plasma gas is emitted. The emitting head is configured to be movable between the target object the temperature sensor.

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Patent Owner(s)

Patent OwnerAddress
FUJI CORPORATIONCHIRYU AICHI

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
IKEDO, Toshiyuki Nagoya-shi, JP 12 24
JINDO, Takahiro Anjo-shi, JP 26 58

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