TREATMENT SYSTEM AND CONTROL APPARATUS

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20200078075A1
SERIAL NO

16680722

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A treatment system includes a control apparatus having respective first and second output sources that supplies respective high-frequency power defined by a first electrical energy and a second electrical energy. The control apparatus includes a processor configured to acquire a first value based on the first electrical energy and a second value based on the second electrical energy. Based on the first value, the processor determines influence given to the second value by the first electrical energy. Based on the influence given to the second value, the processor adjusts an output instruction value to the second output source by the first electrical energy and the second value based on the second electrical energy. The control apparatus is configured to properly calculate a physical quantity relating to the first and second electrical energies even when an electrical noise is generated in a state in which multiple electrical energies are simultaneously supplied.

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Patent Owner(s)

Patent OwnerAddress
OLYMPUS CORPORATIONHACHIOJI-SHI TOKYO 192-8507

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Katsuragi, Toshifumi Tokyo, JP 14 144

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