METHOD FOR MANUFACTURING ACTIVE MATRIX SUBSTRATE AND METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY DEVICE WITH TOUCH SENSOR

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20200089037A1
SERIAL NO

16571325

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method for manufacturing an active matrix substrate including a thin film transistor disposed for each pixel, and a first electrode and a first wiring line for touchscreen panel function includes: (A) a step of forming an oxide semiconductor layer, a gate insulating layer, and a gate electrode on a substrate; (B) a step of forming an insulating layer covering the gate electrode, the gate insulating layer, and the oxide semiconductor layer, and having a source-side aperture and a drain-side aperture through which portions of the oxide semiconductor layer are exposed; (C) a step of forming a source electrode within the source-side aperture and a drain electrode within the drain-side aperture; (D) a step of forming an interlayer insulating layer including an organic insulating layer and having a first contact hole through which a portion of the drain electrode is exposed; (E) a step of forming a first transparent electrically conductive film on the interlayer insulating layer and within the first contact hole; (F) a step of forming by using a metal film, on a portion of the first transparent electrically conductive film, an upper wiring portion to become an upper layer of the first wiring line; (G) a step of patterning the first transparent electrically conductive film to make a pixel electrode and form a lower wiring portion to become a lower layer of the first wiring line; (H) a step of forming a dielectric layer covering the pixel electrode and the first wiring line and having a second contact hole through which a portion of the first wiring line is exposed; and (I) a step of forming, on the dielectric layer and within the second contact hole, a common electrode which is electrically connected to the first wiring line within the second contact hole. When viewed from a normal direction of the substrate, a bottom face of the first contact hole at least partially overlaps a bottom face of the drain-side aperture, and a bottom face of the second contact hole at least partially overlaps a bottom face of the source-side aperture.

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Patent Owner(s)

Patent OwnerAddress
SHARP KABUSHIKI KAISHASAKAI-SHI OSAKA 590-8522

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HARA, Kengo Sakai City, JP 63 258
KIKUCHI, Tetsuo Sakai City, JP 191 1364
MORINAGA, Junichi Sakai City, JP 56 168
YOSHINO, Hikaru Sakai City, JP 13 21

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