PRISM-MASK FOR ANGLED PATTERNING APPLICATIONS

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20200096873A1
SERIAL NO

16143206

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Embodiments disclosed herein include a lithographic patterning system and methods of using such a system to form a microelectronic device. The lithographic patterning system includes an actinic radiation source, a stage having a surface for supporting a substrate with a resist layer, and a prism with a first surface over the stage, where the first surface has a masked layer and is substantially parallel to the surface of the stage. The prism may have a second surface that is substantially parallel to the first surface. The first and second surfaces are flat surfaces. The prism is a monolithic prism-mask, where an optical path passes through the system and exits the first surface of the prism through the mask layer. The system may include a layer disposed between the mask and resist layers. The mask layer of the prism may pattern the resist layer without an isolated mask layer.

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Patent Owner(s)

Patent OwnerAddress
INTEL CORPORATION2200 MISSION COLLEGE BOULEVARD SANTA CLARA CA 95054

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ARANA, Leonel Phoenix, US 14 139
LIU, Changhua Chandler, US 11 3
MARTIN, Keith J Hillsboro, US 5 7
PARICHEHREH, Vahidreza Gilbert, US 2 0

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