GAS/LIQUID PLASMA REACTOR WITH PULSED POWER SUPPLY AND SECONDARY DIRECT CURRENT ELECTRODES

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20200102231A1
SERIAL NO

16514704

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A reactor system for reacting liquid phase chemical species in a liquid includes a reactor vessel for containing the liquid phase and a gas phase. The reactor vessel can have a gas injection port, a gas exit port, and a liquid-gas interface location within the reactor vessel. A pulsed discharge cathode and anode are provided for creating a pulsed discharge electric field at the liquid-gas interface location. A pulsed discharge power supply delivers a pulsed power input to the pulsed discharge cathode and anode, and thereby creates a plasma comprising ions at the liquid-gas interface location. A secondary electric field source is provided for directing a secondary electric field transverse to the liquid-gas interface. The secondary electric field will drive some of the ions from the gas phase into the liquid phase to react with the liquid phase chemical species. A method for reacting a liquid phase chemical species is also disclosed.

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Patent Owner(s)

Patent OwnerAddress
FLORIDA STATE UNIVERSITY RESEARCH FOUNDATION INC2000 LEVY AVENUE STE 351 TALLAHASSEE FL 32310

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Locke, Bruce R Tallahassee, US 12 45
Tang, Youneng Tallahassee, US 6 3
Wandell, Robert J Tallahassee, US 2 1

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