CHEMICAL MECHANICAL POLISHING COMPOSITION AND METHOD OF POLISHING SILCON DIOXIDE OVER SILICON NITIRIDE
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United States of America Patent
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Apr 2, 2020
app pub date -
Sep 25, 2019
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Sep 28, 2018
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Abstract
A chemical mechanical polishing composition for polishing silicon dioxide over silicon nitride includes certain acidic heterocyclic nitrogen compounds having a pK value of 5 of less. Also, methods for polishing a substrate to remove some of the silicon dioxide and silicon nitride are disclosed.
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