Method and apparatuses for disposing of excess material of a photolithographic mask

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11874598
APP PUB NO 20200103751A1
SERIAL NO

16700180

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

The present application relates to a method for disposing of excess material of a photolithographic mask, wherein the method comprises the following steps: (a) enlarging a surface of the excess material; (b) displacing the enlarged excess material on the photolithographic mask using at least one first probe of a scanning probe microscope; and (c) removing the displaced enlarged excess material from the photolithographic mask.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

  • CARL ZEISS SMT GMBH

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baur, Christof Darmstadt, DE 41 284
Bret, Tristan Rixheim, FR 16 135
Budach, Michael Hanau, DE 35 133
Edinger, Klaus Lorsch, DE 34 399

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
3.5 Year Payment $1600.00 $800.00 $400.00 Jul 16, 2027
7.5 Year Payment $3600.00 $1800.00 $900.00 Jul 16, 2031
11.5 Year Payment $7400.00 $3700.00 $1850.00 Jul 16, 2035
Fee Large entity fee small entity fee micro entity fee
Surcharge - 3.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 7.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00