SUBSTRATE PROCESSING APPARATUS

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United States of America Patent

APP PUB NO 20200105547A1
SERIAL NO

16700282

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A substrate processing apparatus includes a substrate stage that supports a substrate, a follower stage disposed on a same plane as the substrate stage, a first driving unit that moves the follower stage in parallel with a first direction, and a second driving unit that moves the substrate stage in parallel with the first direction. The second driving unit includes a voice magnet member disposed on the substrate stage, and a voice coil member disposed on the follower stage and spaced apart from the voice magnet member.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTD129 SAMSUNG-RO YEONGTONG-GU SUWON-SI GYEONGGI-DO 16677

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KIM, JUNG JAE Hwaseong-si, KR 15 99
ONO, KAZUYA Suwon-si, KR 62 915
PARK, SANG-HYUN Yongin-si, KR 159 2838

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