HEAT TREATMENT DEVICE, HEAT TREATMENT METHOD, LASER ANNEALING DEVICE, AND LASER ANNEALING METHOD
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United States of America Patent
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Issued Date -
Apr 2, 2020
app pub date -
Feb 23, 2017
filing date -
Mar 9, 2016
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Abstract
Provided is a heat treatment device including: a laser oscillator configured to produce a laser; one or more optical systems each configured to irradiate an object to be treated with the laser produced from the laser oscillator; and a rotating table on which the object is to be mounted. When a reaching temperature of the object, at which an activation rate of the object reaches a target value through one-time irradiation with the laser, is set as a first temperature, a second temperature lower than the first temperature is set as a target value of the reaching temperature of the object, and the object is repeatedly irradiated with the laser from one of the one or more optical systems two or more times.
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