EUV light source and apparatus for EUV lithography

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10880980
APP PUB NO 20200107426A1
SERIAL NO

16426489

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Abstract

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A metal reuse system for an extreme ultra violet (EUV) radiation source apparatus includes a first metal collector for collecting metal from vanes of the EUV radiation source apparatus, a first metal storage coupled to the first metal collector via a first conduit, a metal droplet generator coupled to the first metal storage via a second conduit, and a first metal filtration device disposed on either one of the first conduit and the second conduit.

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Han-Lung Kaohsiung, TW 52 50
Chang, Hsiao-Lun Tainan, TW 13 10
Chen, Li-Jui Hsinchu, TW 270 472
Cheng, Po-Chung Chiayi County, TW 154 219
Cheng, Wei-Shin Hsinchu, TW 21 9

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