METHOD OF MANUFACTURING SPUTTERING TARGET AND SPUTTERING TARGET
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United States of America Patent
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Apr 16, 2020
app pub date -
Dec 13, 2019
filing date -
Mar 31, 2014
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Abstract
The manufacturing cost of a sputtering target is reduced and the impurity concentration of the manufactured sputtering target is also reduced. A method of manufacturing a sputtering target includes: surface-treating at least one of a used sputtering target and a scrap material; melting at least one of the used sputtering target and the scrap material after the surface treatment to form an ingot; and manufacturing a sputtering target by subjecting the ingot to forging, rolling, heat treating, and machining.
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