NAIL POLISH REMOVING COMPOSITION
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United States of America Patent
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Issued Date -
Apr 30, 2020
app pub date -
Oct 31, 2018
filing date -
Oct 31, 2018
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Abstract
The invention relates to compositions for removing nail polish comprising a solvent and a high load of colorant, preferably between 0.5 wt % and 5.0 wt %. Preferably, the composition has an absorption peak in a range between 460 nm and 600 nm, and a normalized extinction of at least 0.5 for at least one wavelength in the range when measured in an optically transparent solvent via spectrophotometer and across 1 cm path length in a ratio of 1:8 composition to optically transparent solvent. Methods of removing nail polish are also provided.
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