METHOD FOR FORMING CIRCUIT PATTERN ON SURFACE OF THREE-DIMENSIONAL STRUCTURE

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United States of America Patent

APP PUB NO 20200178396A1
SERIAL NO

16697186

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Abstract

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A method for forming a circuit pattern on a surface of a 3D structure includes: forming a first insulation layer on the surface of the 3D structure; forming a conductive pattern on the first insulation layer; forming a second insulation layer on the conductive pattern except for a circuit element mounting region; and mounting one or more circuit elements on the circuit element mounting region.

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Patent Owner(s)

Patent OwnerAddress
MDM INC(HORIM-DONG) #1-409 DAEGU MACHATRONICS&MATERIALS INSTITUTE 32 SEONGSEOGONGDAN-RO 11-GIL DALSEO-GU DAEGU 42714

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Ku Yong Yangsan-si, KR 8 23

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