Photomask blank, and method of manufacturing photomask
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United States of America Patent
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Sep 28, 2021
Grant Date -
Jun 18, 2020
app pub date -
Nov 22, 2019
filing date -
Dec 12, 2018
priority date (Note) -
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status (Latency Note)
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Abstract
A photomask blank for a material of a photomask used in pattern transfer by exposure light having a wavelength of up to 250 nm, including a transparent substrate, a chromium-containing film directly formed on the substrate or formed with an optical film intervened between the transparent substrate and the chromium-containing film. The chromium-containing film includes a region (A) composed of a chromium compound containing chromium, oxygen and carbon, wherein each of contents of the elements contained in the chromium compound is continuously varied in the thickness direction of the region (A), and toward the substrate, the content of chromium increases, and the content of carbon decreases.
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