SPUTTERING TARGET AND METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING MAGNETIC RECORDING MEDIUM
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Jul 23, 2020
app pub date -
Sep 28, 2018
filing date -
Mar 27, 2018
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
The present disclosure provides a sputtering target containing one or more metals of Fe, Co, Cr, and Pt, and one or more of C and BN, with less generation of particles, and a method for producing the same. A sputtering target including: one or more metallic phases selected from a group consisting of Fe, Co, Cr, and Pt; and one or more nonmetallic phases selected from a group consisting of C and BN, wherein the sputtering target satisfies: A≤40, and A/B≤1.7 in which A represents the number of boundaries between the metallic phases and the nonmetallic phases on a line segment having a length of 500 μm drawn in a vertical direction, in a structure photograph; and B represents the number of boundaries between the metallic phases and the nonmetallic phases on a line segment having a length of 500 μm drawn in a horizontal direction, in the structure photograph.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully