SEMICONDUCTOR PROCESSING COMPOSITION AND PROCESSING METHOD
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United States of America Patent
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Issued Date -
Nov 19, 2020
app pub date -
May 11, 2020
filing date -
May 13, 2019
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Abstract
A semiconductor processing composition that can reduce an etching rate of cobalt and minimize corrosion of a cobalt site due to a surface treatment when used for a treatment such as semiconductor cleaning and chemical mechanical polishing. A semiconductor processing composition according to one aspect of the disclosure is a semiconductor processing composition which includes glutamic acid, and at least one selected from the group consisting of histidine, cysteine and glycine, and used for processing an exposed cobalt surface. A semiconductor processing composition according to one aspect of the disclosure is a semiconductor processing composition which includes a compound having a structure in which glutamic acid, and at least one selected from the group consisting of histidine, cysteine and glycine are peptide-bonded and is used for processing an exposed cobalt surface.
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