Cleaning method and recording medium for recording cleaning program

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11530486
APP PUB NO 20210079533A1
SERIAL NO

17016394

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Abstract

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A cleaning method for a by-product including a refractory material or a metal compound includes a reforming process and an etching process. In the reforming process, a surface of the by-product is reformed using nitrogen-containing gas and hydrogen-containing gas. In the etching process, the reformed surface is etched using halogen-containing gas and inert gas.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITEDTOKYO 107-6325

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sato, Naoki Miyagi, JP 161 1292
Shirasawa, Daisuke Miyagi, JP 6 38

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