ETCHANT COMPOSITION AND METHOD FOR ETCHING

Number of patents in Portfolio can not be more than 2000

United States of America

SERIAL NO

17132560

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Abstract

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An etchant composition that is capable of batch etching treatment of a tungsten film and a titanium nitride film and a method for etching using said etchant composition are provided. The etching composition of the present invention is an etchant composition comprising nitric acid and water for batch etching treatment of a tungsten film and a titanium nitride film.

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Patent Owner(s)

Patent OwnerAddress
KANTO KAGAKU KABUSHIKI KAISHATOKYO 103-0023

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KOUNO, Ryou Saitama, JP 3 10
OHWADA, Takuo Saitama, JP 18 94

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