RAW MATERIAL FOR FORMING THIN FILM BY ATOMIC LAYER DEPOSITION METHOD AND METHOD FOR PRODUCING THIN FILM

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United States of America Patent

APP PUB NO 20210155638A1
SERIAL NO

17048360

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Abstract

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Provided is a thin-film forming raw material, which is used in an atomic layer deposition method, including a magnesium compound represented by the following general formula (1):

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Patent Owner(s)

Patent OwnerAddress
ADEKA CORPORATIONARAKAWA-KU TOKYO 116-8554

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
ENZU, Masaki Tokyo, JP 20 19
NISHIDA, Akihiro Tokyo, JP 58 349
TAKEDA, Keisuke Tokyo, JP 38 195

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