Plasma source and method for removing materials from substrates utilizing pressure waves

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United States of America Patent

PATENT NO 11810756
APP PUB NO 20210183617A1
SERIAL NO

17162681

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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In a method is provided for removing a material from a substrate, a plasma is generated at atmospheric pressure. The plasma includes an energetic species reactive with one or more components of the material. The plasma is flowed from an outlet as a plasma plume that includes periodic regions of high plasma density and low plasma density. The material is exposed to the plasma plume. At least one component of the material reacts with the energetic species, and at least one other component of the material is physically impacted and moved by one or more of the regions of high plasma density.

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Patent Owner(s)

  • AP SOLUTIONS, INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Yancey, Peter Joseph Cary, US 10 11

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