POLYURETHANE FOR POLISHING LAYERS, POLISHING LAYER, POLISHING PAD AND METHOD FOR MODIFYING POLISHING LAYER

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20210380845A1
SERIAL NO

17285499

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Abstract

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Disclosed is a polyurethane for use in a polishing layer, including a carboxylic acid ester group, and a polyurethane preferably having a carboxylic acid ester group in at least one of a side chain, a main chain terminal, and a main chain skeleton is preferably used. Also disclosed is a method for modifying a polishing layer, including the steps of: preparing a polishing layer including a polyurethane having a carboxylic acid ester group; and hydrolyzing the carboxylic acid ester group of the polyurethane, to produce a carboxyl group.

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Patent Owner(s)

Patent OwnerAddress
KURARAY CO LTDOKAYAMA 710-0801

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KATO, Mitsuru Kurashiki-shi, Okayama, JP 67 674
KATO, Shinya Tokyo, JP 89 518
OKAMOTO, Chihiro Kurashiki-shi, Okayama, JP 23 98
SUNAYAMA, Azusa Kurashiki-shi, Okayama, JP 3 0
TAKEGOSHI, Minori Kurashiki-shi, Okayama, JP 12 38

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