POLYURETHANE FOR POLISHING LAYERS, POLISHING LAYER AND POLISHING PAD

Number of patents in Portfolio can not be more than 2000

United States of America

APP PUB NO 20210388234A1
SERIAL NO

17288579

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Abstract

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Disclosed are a polyurethane for use in a polishing layer, and a polishing layer and a polishing pad using the same, the polyurethane including a terminal group represented by the following formula (I): R—(OX)n— (I) wherein R represents a monovalent hydrocarbon group having 1 to 30 carbon atoms that may be substituted with a heteroatom or may be interrupted by a heteroatom, X represents an alkylene group having 2 to 4 carbon atoms, 90 to 100% of the alkylene group being an ethylene group, and n represents a number from 8 to 120.

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Patent Owner(s)

Patent OwnerAddress
KURARAY CO LTDKURASHIKI-SHI OKAYAMA 710-0801

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KATO, Mitsuru Kurashiki-shi, Okayama, JP 67 674
KATO, Shinya Tokyo, JP 89 518
OKAMOTO, Chihiro Kurashiki-shi, Okayama, JP 23 98

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