Manufacture Method of Mask for Evaporation and Mask for Evaporation
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United States of America
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Issued Date -
Dec 30, 2021
app pub date -
Mar 6, 2019
filing date -
Mar 6, 2019
priority date (Note) -
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Abstract
The present disclosure provides a manufacture method of a mask for evaporation and a mask. The manufacture method of a mask for evaporation includes: providing an open mask the open mask including at least one open region (BB); forming a photoresist layer at least in the at least one open region, at least a portion of a pattern of the photoresist layer in the open region (BB) being identical to a hollow portion pattern of the mask for evaporation; and depositing a material of the mask for evaporation in a region in which the photoresist layer is formed, so as to form the non-hollow portion pattern of the mask for evaporation, in which the non-hollow portion pattern is connected to a side wall of the open region at an edge of the non-hollow portion pattern.
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