Sputtering Target and Method for Producing Same
Number of patents in Portfolio can not be more than 2000
United States of America
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Issued Date -
Feb 3, 2022
app pub date -
Sep 20, 2019
filing date -
Sep 20, 2019
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Abstract
Provided is a cylindrical sputtering target made of a metal material, which has reduced particles. The sputtering target includes at least a target material, wherein the target material comprises one or more metal elements, the target material has a crystal grain size of 50 μm or less, and the target material has an oxygen concentration of 1000 ppm by mass or less.
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