CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS
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United States of America Patent
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Issued Date -
May 12, 2022
app pub date -
Jan 27, 2022
filing date -
Jan 27, 2022
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Abstract
A method is for cleaning an edge ring. The edge ring includes an inner edge ring provided near a substrate mounted on an electrostatic chuck in a processing chamber, a central edge ring that is provided at an outer side of the inner edge ring and vertically movable by a moving mechanism, and an outer edge ring provided at an outer side of the central edge ring. The method includes applying a direct current voltage to the electrostatic chuck, and moving the central edge ring upward or downward.
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