METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT AND CHEMICAL SOLUTION TO BE USED IN METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT
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United States of America
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Jun 30, 2022
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Dec 14, 2021
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Dec 14, 2021
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Abstract
A method for producing a semiconductor element and a chemical solution to be used in the method for producing a semiconductor element, the method including dry-etching or chemically-mechanically polishing a ruthenium-containing layer located as an uppermost layer of a substrate; and bringing a surface of the substrate into contact with a chemical solution thereby satisfactorily cleaning and removing a ruthenium residue formed on the surface of the substrate; and a chemical solution to be suitably used in the method for producing a semiconductor element.
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