SILICON CARBONITRIDE POLISHING COMPOSITION AND METHOD
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United States of America Patent
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Aug 4, 2022
app pub date -
Feb 4, 2022
filing date -
Feb 4, 2021
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Abstract
A chemical mechanical polishing composition for polishing a substrate including a silicon carbonitride layer, the composition comprising, consisting essentially of, or consisting of a water based liquid carrier, anionic colloidal silica particles dispersed in the liquid carrier, a topography control agent, and having a pH in a range from about 2 to about 7.
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