METHOD FOR PRODUCING SILICON FRAGMENTS
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United States of America Patent
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Issued Date -
Oct 6, 2022
app pub date -
Aug 29, 2019
filing date -
Aug 29, 2019
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Abstract
The present disclosure relates to a method for producing polycrystalline silicon fragments. The process includes (a) providing a polycrystalline silicon rod, (b) working the surface of the silicon rod by means of a hammer or needle hammer to remove at least a portion of a layer of the surface of the polycrystalline silicon rod, and (c) reducing the silicon rod to fragments. Wherein an amount of impact energy expended by the hammer and/or needle hammer is from 1 J to 15 J.
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