PHOTOMASK BLANK AND PHOTOMASK USING THE SAME
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United States of America Patent
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Nov 3, 2022
app pub date -
Apr 26, 2022
filing date -
Apr 26, 2022
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Abstract
Disclosed is a photomask comprising: a transparent substrate; and a multi-layer light shielding pattern film disposed on the transparent substrate, wherein the multi-layer light shielding pattern film comprises: a first light shielding film; and a second light shielding film disposed on the first light shielding film and comprising a transition metal and at least one selected from the group consisting of oxygen and nitrogen, and wherein a surface roughness Wr of the measuring zone satisfies Equation 1 below:
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