Importance

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Abstract

A deposition apparatus supplies mist containing fine particles to a substrate and forms a film including the fine particles on a substrate surface, and includes an air guide member that covers at least a portion of the substrate surface, and a mist supplying section that supplies mist to a space between the substrate surface and the air guide member. The mist supplying section includes a charge applying section, which applies a positive or negative charge to the mist, and a mist ejecting section, which ejects the mist charged by the mist applying section into the space. The air guide member has a wall surface facing the substrate surface, and the deposition apparatus includes an electrostatic field generating section that causes a potential having a same sign as the mist charged by the charge applying section to be generated by the wall surface.

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First Claim