INITIATED CHEMICAL VAPOR DEPOSITION AND STRUCTURATION OF POLYOXYMETHYLENE

United States of America Patent

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Nov 24, 2022
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Feb 9, 2021
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Feb 9, 2021

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Abstract

This invention relates to a method for synthesizing polyoxymethylene on a substrate. The method includes depositing monomer capable of forming polyoxymethylene by an initiated polymerization reaction and an initiator, via initiated chemical vapor deposition (iCVD) onto a surface of a substrate in an initiated chemical vapor deposition reactor.

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DREXEL UNIVERSITY	PHILADELPHIA PA

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Inventor Name	Address	# of filed Patents	Total Citations
CHEN, Zhengtao	Hangzhou, CN	3	0
LAU, Kenneth KS	Haddonfield, US	3	16

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INITIATED CHEMICAL VAPOR DEPOSITION AND STRUCTURATION OF POLYOXYMETHYLENE

Number of patents in Portfolio can not be more than 2000

United States of America Patent

17759082

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17759082

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