SHUTTER DISK FOR PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER
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United States of America Patent
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Issued Date -
Mar 9, 2023
app pub date -
Aug 31, 2022
filing date -
Sep 3, 2021
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Abstract
Methods and apparatus reduce defects in substrates processed in a physical vapor (PVD) chamber. In some embodiments, a method for cleaning a process kit disposed in an inner volume of a process chamber includes positioning a non-sputtering shutter disk on a substrate support of the PVD chamber; energizing an oxygen-containing cleaning gas disposed in the inner volume of the PVD chamber to create a plasma reactive with carbon-based materials; and heating the process kit having a carbon-based material adhered thereto while exposed to the plasma to remove at least a portion of the carbon-based material adhered to the process kit.
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