POLISHING OF POLYCRYSTALLINE MATERIALS
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United States of America Patent
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Issued Date -
Apr 27, 2023
app pub date -
Oct 20, 2022
filing date -
Oct 27, 2021
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Abstract
The invention provides methodology for final finishing of hard surfaces such as diamond surfaces. In this method, a smooth pad having a surface roughness of about 0.2 nm to about 100 nm, having, for example a thickness ranging from about 0.02 mm to about 5 mm, and a Shore D hardness of 30 or higher, is utilized in conjunction with known polishing slurries to provide diamond surfaces having superior smooth finishes.
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