CONTROLLED DEPOSITION METHOD OF A DONOR MATERIAL ONTO A TARGET SURFACE AND PLATE THEREFOR

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United States of America Patent

APP PUB NO 20230156926A1
SERIAL NO

17916861

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Abstract

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A method of depositing a donor material onto a target surface is provided herein, in which a first main side of a substrate is covered with a stretchable layer that is attaching thereto with a sealing around an enclosed area at the first main side, therewith defining an enclosure. The stretchable layer has an outer surface that faces away from the substrate, and that is patterned with one or more recessed areas filled with the donor material to be deposited. A relatively high pressure is provided in an interior of the enclosure so that its volume is increased and the patterned surface of the stretchable layer is pressed against the target surface. In that state of the stretchable layer the substrate is irradiated at a second main side opposite its first main side with photon radiation that has an intensity and a duration that causes a transfer of donor material from the one or more recessed areas to the target surface. Also a plate and a deposition device are provided.

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Patent Owner(s)

Patent OwnerAddress
NEDERLANDSE ORGANISATIE VOOR TOEGEPAST-NATUURWETENSCHAPPELIJK ONDERZOEK TNOANNA VAN BUERENPLEIN 1 2595 DA 'S-GRAVENHAGE NETHERLANDS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
HENDRIKS, Rob Jacob Eindhoven, NL 21 21

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