SYSTEMS AND METHODS FOR PROCESSING A SILICON SURFACE USING MULTIPLE RADICAL SPECIES

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United States of America Patent

APP PUB NO 20230193475A1
SERIAL NO

18068399

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Abstract

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A method of processing a silicon surface includes using a first radical species to remove contamination from the surface and to roughen the surface; and using a second radical species to smooth the roughened surface. Reaction systems for performing such a method, and silicon surfaces prepared using such a method, also are provided.

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ASM IP HOLDING B VVERSTERKERSTRAAT 8 ALMERE 1322 AP

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Demos, Alexandros Scottsdale, US 37 2300
Deye, Gregory Phoenix, US 10 270
M'Saad, Hichem Paradise Valley, US 125 14393
Miskin, Caleb Mesa, US 30 262
Reiter, Steven Phoenix, US 7 121
Wang, Fei Phoenix, US 1116 10607

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