PURIFICATION METHOD OF HIGH PURITY ISOPROPYL ALCOHOL USED IN SEMICONDUCTOR CLEANING PROCESS
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United States of America Patent
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Issued Date -
Nov 16, 2023
app pub date -
May 10, 2023
filing date -
May 10, 2023
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Abstract
In a method for purifying highly pure isopropyl alcohol used in a semiconductor cleaning process, diacetone alcohol present in isopropyl alcohol is removed by an adsorption process, and diacetone alcohol, triisopropyl borate, and metal impurities are removed by a distillation process. The purified isopropyl alcohol may have a purity of has the moisture of 10 ppm or less, the triisopropyl boron compound of 50 ppt or less, and each metal of the metal impurities of 20 ppt or less.
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