ETCH PROCESS FOR OXIDE OF ALKALINE EARTH METAL
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United States of America Patent
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Issued Date -
Nov 23, 2023
app pub date -
May 17, 2022
filing date -
May 17, 2022
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Abstract
A method of processing a substrate that includes: loading the substrate in a plasma processing chamber, the substrate having a surface including an oxide, the oxide including an alkaline earth metal; flowing a process gas including CCl4 into the plasma processing chamber; in the plasma processing chamber, forming a fluorine-free plasma from the process gas by applying a source power to a source electrode of the plasma processing chamber; and exposing the substrate to the fluorine-free plasma to etch the oxide of the surface.
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