BLANK MASK AND PHOTOMASK USING THE SAME

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United States of America Patent

APP PUB NO 20230418150A1
SERIAL NO

18340334

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Abstract

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A blank mask includes a light transmissive substrate, and a light-blocking layer, disposed on the light transmissive substrate, comprising a transition metal and either one or both of oxygen and nitrogen. An average value of grain sizes of a surface of the light-blocking layer ranges from 14 nm to 24 nm.

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Patent Owner(s)

Patent OwnerAddress
SK ENPULSE CO LTDPYEONGTAEK-SI GYEONGGI-DO 17784

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
JEONG, Min Gyo Seoul, KR 24 0
KIM, Seong Yoon Seoul, KR 30 28
KIM, Suhyeon Seoul, KR 42 397
KIM, Tae Young Seoul, KR 205 1465
KIM, Taewan Seoul, KR 96 459
LEE, GeonGon Seoul, KR 19 0
LEE, Hyung-joo Seoul, KR 41 577
SHIN, Inkyun Seoul, KR 30 6
SON, Sung Hoon Seoul, KR 29 107

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