SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
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United States of America Patent
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Issued Date -
Feb 1, 2024
app pub date -
Jul 19, 2023
filing date -
Jul 27, 2022
priority date (Note) -
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status (Latency Note)
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Abstract
A substrate processing apparatus includes: a processing tank configured to store a processing liquid for processing a substrate; a circulation path through which the processing liquid is taken out from the processing tank and is returned to the processing tank; a substrate holder configured to hold the substrate; a lifter configured to raise and lower the substrate holder between an immersion position inside the processing tank and a standby position above the processing tank; and a controller configured to control the lifter, wherein the processing liquid is a mixed liquid obtained by mixing a first component and a second component and generates a heat of mixing, and the controller is configured to perform a control to immerse the substrate in the mixed liquid before a temperature of the mixed liquid rises due to the heat of mixing and reaches a peak temperature.
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