SPUTTERING TARGET

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20240043986A1
SERIAL NO

17625399

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The sputtering target of the present disclosure includes: an aluminum matrix; and (1) a material or phase containing aluminum and further containing either a rare earth element or a titanium group element or both a rare earth element and a titanium group element or (2) a material or phase containing either a rare earth element or a titanium group element or both a rare earth element and a titanium group element, at a content of 10 to 70 mol % in the aluminum matrix.

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Patent Owner(s)

Patent OwnerAddress
FURUYA METAL CO LTDTOKYO

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Maruko, Tomohiro Toshima-ku, Tokyo, JP 27 79
Nakamura, Hironobu Toshima-ku, Tokyo, JP 12 106
Otomo, Shohei Toshima-ku, Tokyo, JP 5 0
Suzuki, Yu Toshima-ku, Tokyo, JP 39 453

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