SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD
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United States of America Patent
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Issued Date -
Mar 7, 2024
app pub date -
Dec 14, 2021
filing date -
Jan 25, 2021
priority date (Note) -
Published
status (Latency Note)
Importance
Abstract
A substrate cleaning apparatus includes a substrate rotation supporting section that supports and rotates a substrate; a roll holding section that rotatably holds a first roll cleaning member and a second roll cleaning member each having a length almost equal to a radius of the substrate; a roll rotation drive section that rotates the first roll cleaning member and the second roll cleaning member about respective axes of rotation parallel to a front surface of the substrate; and a roll pressing section that brings the first roll cleaning member and the second roll cleaning member that are rotating into sliding contact with the front surface of the substrate. The first roll cleaning member and the second roll cleaning member are disposed so as to cover different radial parts of the front surface of the substrate.
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Cited Art Landscape
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