SLURRY ARM AND CHEMICAL MECHANICAL POLISHING APPARATUS INCLUDING THE SAME

Number of patents in Portfolio can not be more than 2000

United States of America Patent

APP PUB NO 20240075581A1
SERIAL NO

18120209

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A slurry arm is provided. The slurry arm includes: an arm body; a slurry line that extends through the arm body; an oxygen removal chamber provided in the arm body and configured to receive slurry from the slurry line; a purge gas supplier configured to supply a purge gas to the slurry in the oxygen removal chamber; and a main valve configured to selectively discharge gas from the oxygen removal chamber.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTDSUWON-SI

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
KWON, DONGHOON Suwon-si, KR 53 6
Yoon, IlYoung Suwon-si, SI 23 50

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