IMPROVEMENTS RELATING TO SIPHON SYSTEMS AND VACUUM PUMPS

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United States of America Patent

APP PUB NO 20240077144A1
SERIAL NO

18263336

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A vacuum pump for use with a siphon system to continuously purge gases that accumulate in a high point of the siphon system, or for priming the inlet to a pump, or to create vacuum for another purpose. Siphon systems require regular purging of gases when operating for long periods of time. The vacuum pump provides a mechanism that operates in a cycling manner. A first stage of the cycle involves filling a chamber using a pressurised liquid supply, and purging all gases from the chamber. A second stage involves isolating the chamber from the surrounding environment, and then allowing the liquid in the chamber to drain into the siphon system, while at the same time gases from within the siphon system are allowed to enter the chamber. Once the liquid has drained from the chamber, the chamber is isolated from the siphon system, and the liquid filling stage is repeated. Continual cycling of this process can purge the siphon system of gases, or be used to produce a vacuum for other purposes.

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Patent Owner(s)

Patent OwnerAddress
GARDINER THOMAS FALKLANDWAIMAUKU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
GARDINER, Thomas Falkland Waimauku, NZ 1 0

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