SUBSTRATE CLEANING DEVICE AND METHOD OF CLEANING SUBSTRATE
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United States of America Patent
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Issued Date -
Mar 14, 2024
app pub date -
Nov 16, 2023
filing date -
Dec 28, 2020
priority date (Note) -
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Abstract
A substrate cleaning device includes a rotation mechanism that rotates the substrate, a first cleaning solution supply nozzle that discharges a cleaning solution to which ultrasonic vibration is applied to the surface of the substrate, and a swing mechanism that swings the first cleaning solution supply nozzle from a vicinity of a rotation center of the substrate toward an outer peripheral edge of the substrate in a range narrower than a half-surface of the substrate.
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