SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD
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United States of America Patent
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Issued Date -
Mar 21, 2024
app pub date -
Sep 14, 2023
filing date -
Sep 21, 2022
priority date (Note) -
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Abstract
A substrate cleaning apparatus includes an upper holding device holding an outer peripheral end of a substrate, and a lower surface brush contacting a lower surface of the substrate to clean the lower surface. The lower surface brush moves from a state of being separated from the lower surface to contact a first partial region of the lower surface when cleaning of a lower surface central region of the substrate is started. Then, the lower surface brush moves into contact with the lower surface central region on the lower surface. The lower surface brush moves from a state of being in contact with the lower surface to be separated from a second partial region of the lower surface when cleaning of the lower surface central region is completed. At least one of the first partial region and the second partial region does not overlap the lower surface central region.
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