ATTENUATED PHASE SHIFT MASK FOR TALBOT LITHOGRAPHY

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United States of America Patent

APP PUB NO 20240094623A1
SERIAL NO

17899263

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Abstract

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A system for creating patterns on a wafer by using an attenuated phase shift mask with variable feature sizes and using Talbot lithography.

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Patent Owner(s)

Patent OwnerAddress
META PLATFORMS INC1 META WAY MENLO PARK CA 94025

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Corliss, Daniel Albert Redmond, US 1 0
Xu, Cheng Kirkland, US 257 1148

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