APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE

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United States of America Patent

APP PUB NO 20240100572A1
SERIAL NO

18182498

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Abstract

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The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a support unit configured to support a substrate; and a cleaning unit configured to clean a bottom surface of the substrate supported on the support unit, and wherein the cleaning unit comprises: a body; and a protrusion formed to be upwardly protruding from the body, and the protrusion is positioned to be spaced apart from the bottom surface.

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Patent Owner(s)

Patent OwnerAddress
SEMES CO LTDCHEONAN-SI

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
EOM, Sung Hun Hwaseong-si, KR 13 6
Yoo, Ha Neul Anyang-si, KR 5 1
Yu, Ji Hyeong Uijeongbu-si, KR 1 0
Yun, Tae Won Namwon-si, KR 7 0

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