LITHIUM PRECURSORS FOR DEPOSITION OF LITHIUM-CONTAINING LAYERS, ISLETS OR CLUSTERS

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United States of America Patent

APP PUB NO 20240102161A1
SERIAL NO

17767771

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Abstract

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Methods for forming a Li-containing film, islet or cluster on a substrate comprise the steps of introducing a vapor of a silicon-free lithium precursor into a reactor and depositing at least part of the silicon-free lithium precursor onto the substrate to form the Li-containing film, islet or cluster using a vapor deposition method.

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Patent Owner(s)

Patent OwnerAddress
L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE75007 PARIS

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
BLASCO, Nicolas Paris, FR 43 1053
DUSSARRAT, Christian Yokosuka, JP 139 7373
KAMIMURA, Sunao Tsukuba, JP 5 0
YAMAMOTO, Keishi Yokosuka, JP 7 14

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