COMPOSITIONS AND METHODS OF USE THEREOF

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United States of America Patent

APP PUB NO 20240141205A1
SERIAL NO

18408986

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Abstract

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This disclosure relates to a composition that includes at least one first ruthenium removal rate enhancer; at least one copper removal rate inhibitor; at least one low-k removal rate inhibitor; and an aqueous solvent.

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Patent Owner(s)

Patent OwnerAddress
FUJIFILM ELECTRONIC MATERIALS U S A INC80 CIRCUIT DRIVE NORTH KINGSTOWN RI 02852

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hu, Bin Chandler, US 275 1156
Huang, Ting-Kai Tainan City, TW 25 56
Liang, Yannan Gilbert, US 23 6
Piao, Hong Gilbert, US 4 19

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